SKU:19390415621
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um
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Ships within 48 hours · Estimated delivery Jul 29 - Aug 3
Description
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3umSilicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both sides on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced microcracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) Nitride Thickness: 13000 Angstroms + 5% Nitride Ref Index : 2. 30 + 0. 05 UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 100. 0
they are generally not used in dynamic applications
Vaccum level: 10-5 torr by molecular pump and 10-2 torr by mechanical pump
Surface Polishing: One side epi polished
Dimension: 152
All feedthrough can be connected any glove box which has KF25 Port
1350oC Dimension Thickness
Surface finish: (RMS or Ra) : < 30A
Stacking sequence: ABCB (4H)
MTI would like to extend our special thanks to Dr
48 kJ·mol
Orientation: (100)+/- 2 degree
1mm Gas Consumption 490ml/stroke Clean Room Compatibility 1000 grade cleanroom compatible Compressive Gas
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